产品详情
 
IBE

 

我司独家代理美国高端IBE离子束刻蚀系统--功能强大--超高性价比--科研用户首选

 

            

主要用途:

1. Ion Beam Etching to fabricate micro-nanometer features in any material

   (metals, insulators, organics,     composites, multilayers).

 

2. Ion Beam Surface Modification to create nanostructures, textures and    

    smoothness.

 

3. Physical Vapor Deposition to build thin films and stacks by evaporation,

    sputtering and reactive growth.

 

4. Ion Beam Sputter Deposition confronts the need for upper tier thin film

    results, when achieving the highest quality properties and precision

    control is justified.

 

优势:Multifunctional Process Tool combines etching and deposition in one

              vacuum process chamber.

 

系统构成:

 

 

应用领域:1. Semiconductor   2. Nanotechnology  3. Photonics  4. Spintronics

 

适应的刻蚀材料:

1. Noble Metals      2. Insulators           3. Diamond Films             

4. Optical Wave Guides         5. Superconducting Materials              

6. Magnetic Materials

 

工艺能力:1. Ion Beam Etching (IBE)   2. Reactive Ion Beam Etching (RIBE)

 

刻蚀图例:

             

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